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计算机工程 ›› 2010, Vol. 36 ›› Issue (20): 225-228. doi: 10.3969/j.issn.1000-3428.2010.20.079

• 工程应用技术与实现 • 上一篇    下一篇

基于最速下降法的可制造性模型

胡志卷,杨祎巍,史 峥   

  1. (浙江大学超大规模集成电路设计研究所,杭州 310027)
  • 出版日期:2010-10-20 发布日期:2010-10-18
  • 作者简介:胡志卷(1981-),男,硕士研究生,主研方向:EDA软件开发与应用;杨祎巍,博士研究生;史 峥,副教授

Manufacturability Model Based on Steepest Descent Method

HU Zhi-juan, YANG Yi-wei, SHI Zheng   

  1. (Institute of VLSI Design, Zhejiang University, Hangzhou 310027, China)
  • Online:2010-10-20 Published:2010-10-18

摘要: 可制造性设计技术使设计者尽早得到设计版图能否被制造的信息,以减少交流等待的时间。为此,提出一种可制造性模型,用一个或者多个卷积核描述设计版图和轮廓之间的关系,用最速下降法求得,求解过程仅需要输入版图和轮廓对。实验结果表明,该模型能够对设计版图的结果进行较好的预测,与通过光刻模型仿真结果之间的误差在1.8%以内。

关键词: 可制造性设计, 可制造性模型, 仿光刻模型

Abstract: Technologies of Design for Manufacturability(DfM) help IC designers to get the information of manufacturability of an IC design as early as possible to reduce turn-around-time. This paper proposes a new DfM model. One or more convolution kernels are used to describe the relationship between the pattern and contour. The modeling is solved by using steepest descent method, and only pairs of pattern and contour are needed. Experimental results show that the model can predict contour accurately with less than 1.8% differences to lithographic simulation result.

Key words: Design for Manufacturability(DfM), manufacturability model, litho-like model

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